Please use this identifier to cite or link to this item:
https://doi.org/10.21256/zhaw-4744
Publication type: | Article in scientific journal |
Type of review: | Peer review (publication) |
Title: | Nanoscale patterning with block copolymers |
Authors: | Krishnamoorthy, Sivashankar Hinderling, Christian Heinzelmann, Harry |
DOI: | 10.21256/zhaw-4744 10.1016/S1369-7021(06)71621-2 |
Published in: | Materials Today |
Volume(Issue): | 9 |
Issue: | 9 |
Page(s): | 40 |
Pages to: | 47 |
Issue Date: | 2006 |
Publisher / Ed. Institution: | Elsevier |
ISSN: | 1369-7021 1873-4103 |
Language: | English |
Subjects: | Self-assembly; Block-copolymers; Nantoechnology; Review |
Subject (DDC): | 620: Engineering |
Abstract: | The self-assembly processes of block copolymers offer interesting strategies to create patterns on nanometer length scales. The polymeric constituents, substrate surface properties, and experimental conditions all offer parameters that allow the control and optimization of pattern formation for specific applications. We review how such patterns can be obtained and discuss some potential applications using these patterns as (polymeric) nanostructures or templates, e.g. for nanoparticle assembly. The method offers interesting possibilities in combination with existing high-resolution lithography methods, and could become of particular interest in microtechnology and biosensing. |
URI: | https://digitalcollection.zhaw.ch/handle/11475/11958 |
Fulltext version: | Published version |
License (according to publishing contract): | CC BY-NC-ND 3.0: Attribution - Non commercial - No derivatives 3.0 Unported |
Departement: | Life Sciences and Facility Management |
Organisational Unit: | Institute of Chemistry and Biotechnology (ICBT) |
Appears in collections: | Publikationen Life Sciences und Facility Management |
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2006_Krishnamoorthy-Hinderling_Heinzelmann_Nanoscale_patterning.pdf | 2.37 MB | Adobe PDF | View/Open |
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Krishnamoorthy, S., Hinderling, C., & Heinzelmann, H. (2006). Nanoscale patterning with block copolymers. Materials Today, 9(9), 40–47. https://doi.org/10.21256/zhaw-4744
Krishnamoorthy, S., Hinderling, C. and Heinzelmann, H. (2006) ‘Nanoscale patterning with block copolymers’, Materials Today, 9(9), pp. 40–47. Available at: https://doi.org/10.21256/zhaw-4744.
S. Krishnamoorthy, C. Hinderling, and H. Heinzelmann, “Nanoscale patterning with block copolymers,” Materials Today, vol. 9, no. 9, pp. 40–47, 2006, doi: 10.21256/zhaw-4744.
KRISHNAMOORTHY, Sivashankar, Christian HINDERLING und Harry HEINZELMANN, 2006. Nanoscale patterning with block copolymers. Materials Today. 2006. Bd. 9, Nr. 9, S. 40–47. DOI 10.21256/zhaw-4744
Krishnamoorthy, Sivashankar, Christian Hinderling, and Harry Heinzelmann. 2006. “Nanoscale Patterning with Block Copolymers.” Materials Today 9 (9): 40–47. https://doi.org/10.21256/zhaw-4744.
Krishnamoorthy, Sivashankar, et al. “Nanoscale Patterning with Block Copolymers.” Materials Today, vol. 9, no. 9, 2006, pp. 40–47, https://doi.org/10.21256/zhaw-4744.
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