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https://doi.org/10.21256/zhaw-1894| Publication type: | Article in scientific journal |
| Type of review: | Peer review (publication) |
| Title: | Analysis of phase-resolved partial discharge patterns of voids based on a stochastic process approach |
| Authors: | Altenburger, Ruprecht Heitz, Christoph Timmer, Jens |
| DOI: | 10.21256/zhaw-1894 10.1088/0022-3727/35/11/309 |
| Published in: | Journal of Physics D: Applied Physics |
| Volume(Issue): | 35 |
| Issue: | 11 |
| Page(s): | 1149 |
| Pages to: | 1163 |
| Issue Date: | 2002 |
| Publisher / Ed. Institution: | IOP Publishing |
| ISSN: | 0022-3727 1361-6463 |
| Language: | English |
| Subjects: | Data analysis; Statistical analysis; Stochastic modelling |
| Subject (DDC): | 510: Mathematics 621.3: Electrical, communications, control engineering |
| Abstract: | A method is presented for the determination of physical discharge parameters for partial discharges (PD) of voids in solid insulation. Based on a recently developed stochastic theory of PD processes, a statistical analysis of a measured Phase-Resolved Partial Discharge (PRPD) pattern allows the determination of the relevant physical parameters like first electron availability or decay time constants for deployed charge carriers. These parameters can be estimated directly from the measured patterns without the need of performing simulations. Furthermore, error bounds for the parameter values can be given. The parameter estimation algorithm is based on the analysis of a contiguous region of the PRPD pattern where this region can be chosen nearly arbitrarily. Thus, even patterns with several active PD defects or patterns which are corrupted by noise can be analyzed. The method is applied to a sequence of patterns of a void in epoxy resin. The change in first electron availability in the course of a day can be determined quantitatively from the data while the other physical parameters remain constant. |
| URI: | https://digitalcollection.zhaw.ch/handle/11475/4383 |
| Fulltext version: | Published version |
| License (according to publishing contract): | Licence according to publishing contract |
| Departement: | School of Engineering |
| Organisational Unit: | Institute of Data Analysis and Process Design (IDP) |
| Appears in collections: | Publikationen School of Engineering |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| 2002_Altenburger_Analysis of phase-resolved partial discharge patterns_Journal of Physics D.pdf | 559.19 kB | Adobe PDF |  View/Open |
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Altenburger, R., Heitz, C., & Timmer, J. (2002). Analysis of phase-resolved partial discharge patterns of voids based on a stochastic process approach. Journal of Physics D: Applied Physics, 35(11), 1149–1163. https://doi.org/10.21256/zhaw-1894
Altenburger, R., Heitz, C. and Timmer, J. (2002) ‘Analysis of phase-resolved partial discharge patterns of voids based on a stochastic process approach’, Journal of Physics D: Applied Physics, 35(11), pp. 1149–1163. Available at: https://doi.org/10.21256/zhaw-1894.
R. Altenburger, C. Heitz, and J. Timmer, “Analysis of phase-resolved partial discharge patterns of voids based on a stochastic process approach,” Journal of Physics D: Applied Physics, vol. 35, no. 11, pp. 1149–1163, 2002, doi: 10.21256/zhaw-1894.
ALTENBURGER, Ruprecht, Christoph HEITZ und Jens TIMMER, 2002. Analysis of phase-resolved partial discharge patterns of voids based on a stochastic process approach. Journal of Physics D: Applied Physics. 2002. Bd. 35, Nr. 11, S. 1149–1163. DOI 10.21256/zhaw-1894
Altenburger, Ruprecht, Christoph Heitz, and Jens Timmer. 2002. “Analysis of Phase-Resolved Partial Discharge Patterns of Voids Based on a Stochastic Process Approach.” Journal of Physics D: Applied Physics 35 (11): 1149–63. https://doi.org/10.21256/zhaw-1894.
Altenburger, Ruprecht, et al. “Analysis of Phase-Resolved Partial Discharge Patterns of Voids Based on a Stochastic Process Approach.” Journal of Physics D: Applied Physics, vol. 35, no. 11, 2002, pp. 1149–63, https://doi.org/10.21256/zhaw-1894.
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